Being a new gas/liquid membrane separation process, degassing membrane technology makes the removal rate of oxygen in water more than 90%/96% with vacuum pumping, vacuum pumping + N2 and other methods and makes the removal rate of carbon dioxide in water more than 85%/98% with air blowing, air exhaust + air blowing and other methods, so that the users can also improve the degassing effect with degassing membranes in series and other methods.
1. Carbon dioxide in degassing liquid
The system water of reverse osmosis and electrostatic desalination or continuous electrostatic desalination is used to reduce the content of carbon dioxide in water. Electrostatic desalination with high conductivity or water penetration of continuous electrostatic desalination will reduce the resistivity value of its outlet water. The dissolved carbon dioxide in water is the main reason for high conductivity in water. Degassing membrane provides a clean method of the removal of carbon dioxide from water without maintenance and chemical addition for adjusting PH value, and the removal rate reaches 99.9%. If carbon dioxide is removed before EDI or CDI, electrostatic desalination or continuous electrostatic desalination can produce higher water quality for water production, and the resistivity of inlet water of the original reverse osmosis +EDI can increase to 18 MB from the original 1.0 MB. When the dissolved carbon dioxide in water is removed, the removal rate of silicon and boron by EDI/CDI will also increase, so that it is possible to replace the secondary effluent of reverse osmosis as electrostatic desalination water inlet with the primary effluent of reverse osmosis + degassing membrane.
2. Oxygen in degassing liquid
Degassing membrane is widely used for deoxygenation in water and deoxygenation in other liquids. Oxygen has a negative impact on many processes; oxygen will corrode and oxidize materials. In electric power and other industrial fields, pipelines, boilers and devices are easily corroded without degassing. Degassing membrane provides a modular method for deoxygenation in water, which is easy to operate without chemical addition and large degassing towers. It also provides the benefits of simultaneous removal of oxygen, carbon dioxide and nitrogen control only in one step. When semiconductors are flexibly applied to semiconductor and membrane panel industrial fields, oxygen with high content will lead to low yield improvement. In the field of microelectronics, the degassing membrane can meet the dissolved oxygen index of <1ppb and provide a performance guarantee. A perfect alternative can be completely provided to replace degassing towers.
Common applied range